The Zernike polynomial is used to fit the optical aberration, and the analysis of optical mirror aberration is helpful to improve the machining precision of the optical system.

Filename	Size	Update
__MACOSX\wfmpsf\._.DS_Store	82	2011-06-24
__MACOSX\wfmpsf\._cmap_fire.mat	82	2011-06-24
__MACOSX\wfmpsf\._license.txt	302	2011-06-24
__MACOSX\wfmpsf\._maxintensityproj.m	171	2011-06-24
__MACOSX\wfmpsf\._readme.txt	82	2011-06-24
__MACOSX\wfmpsf\._wfmpsf.m	171	2011-06-24
wfmpsf\.DS_Store	6148	2011-06-24
wfmpsf\cmap_fire.mat	1366	2011-06-24
wfmpsf\maxintensityproj.m	2215	2011-06-24
wfmpsf\readme.txt	28864	2011-06-24
wfmpsf\results\DL_PSF.jpg	19147	2011-06-24
wfmpsf\results\SA_PSF.jpg	72340	2011-06-24
wfmpsf\wfmpsf.m	7982	2011-06-24
license.txt	1320	2014-02-12

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