Description: The Zernike polynomial is used to fit the optical aberration, and the analysis of optical mirror aberration is helpful to improve the machining precision of the optical system.
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File list (Check if you may need any files):
| Filename | Size | Date |
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| __MACOSX\wfmpsf\._.DS_Store | 82 | 2011-06-24
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| __MACOSX\wfmpsf\._cmap_fire.mat | 82 | 2011-06-24
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| __MACOSX\wfmpsf\._license.txt | 302 | 2011-06-24
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| __MACOSX\wfmpsf\._maxintensityproj.m | 171 | 2011-06-24
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| __MACOSX\wfmpsf\._readme.txt | 82 | 2011-06-24
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| __MACOSX\wfmpsf\._wfmpsf.m | 171 | 2011-06-24
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| wfmpsf\.DS_Store | 6148 | 2011-06-24
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| wfmpsf\cmap_fire.mat | 1366 | 2011-06-24
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| wfmpsf\maxintensityproj.m | 2215 | 2011-06-24
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| wfmpsf\readme.txt | 28864 | 2011-06-24
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| wfmpsf\results\DL_PSF.jpg | 19147 | 2011-06-24
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| wfmpsf\results\SA_PSF.jpg | 72340 | 2011-06-24
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| wfmpsf\wfmpsf.m | 7982 | 2011-06-24
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| license.txt | 1320 | 2014-02-12 |
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